Features
Spin coating will result in a relatively uniform thin film of a specific thickness
• User friendly design
• Trouble free performance
• Longer service life
• Maintenance free
• Easy to use
• Fast and Easy Operations
• Minimum Inertia to reach desired RPM
• House in adjust Hood
• Dial Gauge indication of Vacuum Chuck
• 8" Teflon Coated Working Chamber
• Substrate Holder Size: 1/2" 1"" 1 1/2" 2", 3" 4" (Silicon Substrate Only)
• Speed Range-100 to 10000 RPM
• Acceleration- 2000 RPM/Sec (Max)
• Transparent Photo Resist Lid over working chamber
• N2 Purge Facility
• Spill drainage Facility
• Compatible Oil Free Vacuum Pump (Optional)